#FCMN2024
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  • Overview
    • Code of Conduct (PDF)
    • Committee
  • Hotel/Travel
    • Things To Do
  • Registration
  • Schedule
    • Invited Speakers
    • Presentation & Poster Guidelines
    • Technical Program (PDF)
    • Tutorials
      • Tutorial Session I – Machine Learning and its Application to Metrology
      • Tutorial Session II – Metrology Techniques
      • Tutorial Session III – Advanced Packaging
  • Sponsors/Exhibitors
    • Sponsor & Exhibitor Form (PDF)

Schedule

Technical Program

The 2024 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (FCMN) will be held at the Monterey Marriott in Monterey, CA from April 15-18, 2024.

The FCMN will bring together scientists and engineers interested in all aspects of the characterization technology needed for nanoelectronic materials and device research, development, integration, and manufacturing. All approaches are welcome: chemical, physical, electrical, magnetic, optical, in situ, and real-time control and monitoring. The semiconductor industry is evolving rapidly:  the conference will highlight major issues and provide critical reviews of important materials and structure characterization and nearline/inline metrology methods, including hardware, data analysis, and AI and machine learning, as the industry both extends the technology deep into the nanoscale and increases the diversity of devices and systems.

The conference consists of formal invited presentation sessions and poster sessions for contributed papers and three (3) tutorial sessions. The poster papers cover new developments in materials and structure characterization/metrology down to the nanoscale. The conference began in 1995, and this meeting is the 14th in the series.

VIEW TECHNICAL PROGRAM

Tutorial Sessions

The FCMN 2024 organizers have scheduled three (3) limited seating tutorials. Both will take place on Monday, April 15, 2024. Advance registration is required and space is limited to 20 people per tutorial. Registration will be on a first-come, first-served basis.

Tutorial Session I: Machine Learning and its Application to Metrology

Time:  2:00-4:00 p.m.
Cost: $100
Presenter:  Dragan Djurdjanovic , UT Austin

Tutorial Session II: Metrology Techniques

Time:  2:00-4:00 p.m.
Cost: $100
Presenters: Alain Diebold, University of Albany and Paul van der Heide, Imec

Tutorial Session III: Advanced Packaging

Time:  4:30-6:30 p.m.
Cost: $100
Presenter: Ofer Adan, Applied Materials

Invited Speakers

Matthew Andrew Carl Zeiss X-ray Microscopy
Umberto Celano imec
Arie den Boef ASML
Marla Dowell National Institute of Standards and Technology
Rafal Dunin-Borkowski Ernst Ruska Centre for Microscopy and Spectroscopy with Electrons
Claudia Fleischmann Imec
Eugen Foca Carl Zeiss SMT GmbH
Guillaume Freychet CEA Leti
Nicolas Gauquelin Univ. Antwerp EMAT
Rick Gottscho LAM Research
Rudolf Haindl Max Planck Institute
Matt Hetterman EUVTech
Dan Hutcheson TechInsights
Byoungho Lee Hitachi High-Tech Corporation
Tony Levi Univ. of Southern California
Xiaoqin (Elaine) Li University of Texas-Austin
Yan Li Samsung
Kazuhiko Omote Rigaku
Colin Ophus Lawrence Berkeley Laboratory
Jonghyeok Park Samsung Electronics
Amanda Petford-Long Argonne National Lab
Christina Porter ASML
Michael Reisinger KAI GmbH
Hamed Sadeghian Nearfield Instruments
Siamak Salimy Hprobe
Kento Sasaki Univ. of Tokyo
Daniel Schmidt IBM
Nigel Smith Nanometrics
Pooya Tadayon Intel
Eric Van Cappellen Thermo Fisher Scientific
Shay Wolfling Nova
Zhenxin Zhong TFS

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Key Dates

Abstract Submission Deadline Extended:
December 15, 2023

Author Notifications:
Late December-Early January

Early Registration Deadline:
February 15, 2024

Hotel Reservation Deadline:
March 18, 2024

Downloads

  • Code of Conduct (PDF)
  • Sponsor Form
  • Presentation & Poster Guidelines

AVS
Della Miller

Event Manager
110 Yellowstone Dr. Suite 120
Chico, CA 95973
(530) 896-0477
della@avs.org

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